Clean environment control requirements originally were focused mainly on the absence of dust particles in the air. Recently, requirements have been extended to encompass liquids that come into direct contact with the work and liquids used in wet processes, as well as to purity levels that exist in material gases and in the semiconductor manufacturing equipment itself. In the area of pharmaceutics where critical substances are being manufactured, the control of particles in liquid has always been an important consideration.
Aviation and space exploration, heavy machinery, and automobile manufacturing are other fields where particle control in hydraulic systems plays an important role. Coupled with the impressive progress in electronics, mechatronics, and biotechnology, the quality of water, solvents and other chemicals used for cleaning, diluting, and chemical reactions is an essential consideration.
Even beyond the fields mentioned above, the realization is spreading that precise and reliable purity control is important for maintaining product quality and increasing yield. The emphasis in the industry is shifting from the old “cleaning yes-measurement no” to the new principle “always measure both before and after cleaning.”
With high detection efficiency, Rion’s laser liquid-borne particle counting system uses highly reliable, long-life laser diodes, and a technologically superior photo-detector & flow cell. All Rion systems are user friendly, versatile and simple operation for in-situ and batch modes. All system is equipped with standard RS-232-C interface port for computer operation, and are compatible with all liquids from water to strong acids.
