SEMI Fab Front-End

We are experienced in supporting Fabs of all sizes and applications to monitor and manage yield-affecting contaminations.  Our fast response, localized on-site services, and unlimited support compliments the products we offer into a comprehensive solution to meet your requirements.

Liquid Particle Counting

  • Batch Applications : gate and measure quality of chemical deliveries to protect bulk chemical tanks, reduce filtration burden, prevent excursions  
  • Inline Applications : filtration and final polishing monitoring, Particle Defense Line, bulk chemical delivery monitoring, new filter flushing checks, and UPW monitoring
  • Chemical Compatibility : PFA and glass/sapphire wetted parts ensures resistance and compatibility with UPW, aqueous, solvents, blends, acids, HF, bases, and corrosives.
  • Cost Effectiveness : able to measure a wider range of refractive indexes and chemicals than competitor units, modular design enables each switch between batch and inline
  • RION’s superior counting efficiency measures more of the liquid passing through the sensor to allow detection of small fluctuations and more stable data trends

Air Particle Counting

  • Handheld / Portable : particle source detection, clean-room qualifications, spot checks, move and measure
  • Multi-point / Manifold : continuous monitoring of production / filling area cleanliness, 0.08um and 0.10um capable, sampling tubes enables connection to tools and enclosed spaces
  • Capabilities: 0.08um and 0.10um capable
  • ISO 21502 (JIS B 9921): high flow-rate and high counting efficiency

Ultrasonic Concentration Meters

  • Applications : feed chemical monitoring, chemical blending, quality control
  • Fast : real-time measurement, no more waiting for lengthy titration
  • Accurate : superior to conductivity meters, temperature compensating
  • Flexibility : flow-cell type, flanged type, and explosion proof models
  • Easy to Maintain : no consumables, self calibration / verification

Portable Cleanzone System

  • ISO Class 1 capable : less than 10 particles/m3 at 0.1um
  • Fast : establishes a clean-zone in less than 3 minutes (Turn off when not in use)
  • Portable : plug-n-play, standard electric outlet
  • Cost Effective : lower initial cost AND operating cost than standard traditional clean-room
  • Applications : Ultra-clean protection of sensitive test samples, critical processes, and instruments.  Localized filtration of particle generating spots

Litho, Etch, PVD Tool Cleaning – CCW

  • Chuck Cleaning Wafers enable online cleaning to eliminate lengthy tool downtime and associated costs
  • Eliminate ESC flow faults without opening the chamber
  • Eliminate Lithography Hot Spots with No Downtime
  • Eliminate PVD backside pressure faults without opening the chamber
  • See how it works